HEED: Density-Weighted Residual Alignment for Hybrid Vision-Language Model Distillation

h, and MMMU-Pro, while dropping 13 points on optical-character-recognition and document tasks. The student can still understand the scene but loses the fine-grained text needed to answer. We localize much of the failure to a specific kind of position. In a high-resolution image, most patches are sky, wall, or smooth texture, while a small fraction carries text, edges, object boundaries, or other local details. In a token-level diagnostic, the top 10% highest-density patches have 3.6$\times$ larger residual drift than the bottom 10% lowest-density patches and 3.5$\times$ larger teacher-masking answer contribution. Uniform weighting devotes many loss terms to low-information background patches, whereas sparse answer-bearing patches receive no special protection. The required intervention is minimal: we replace uniform residual alignment with density-weighted residual alignment, using patch self-dissimilarity as a training-free proxy for position importance. We call this HEED. Compared with normal end-to-end distillation, HEED increases performance by 8.7 points on OCRBench v2 and 5.13 points on a 10-benchmark average. The gain is realized on different teacher models and hybrid architectures. After standard post-training, the student reaches teacher-level performance on the 10-benchmark average with a 4.12$\times$ throughput and a 68% memory saving at 128k context, with no additional parameters and no inference-time cost.